The patent pending method developed by Parsapour includes an ultrasonication and exposure to water step which involves (1) immersing the catalyst deposited on the substrate in a bath containing a liquid, such as, for example, an aqueous solution or a non-aqueous solution, (2) subjecting the catalyst/bath system to acoustic waves generated from an ultrasonic apparatus (e.g., sonicator), and (3) exposing the catalyst to water (e.g., via rinsing). Following the ultrasonication and exposure to water step, the CNTs are grown utilizing CVD.
The specific enhancement manifests itself as a substantial increase in the length of the CNTs under identical catalytic growth via chemical vapor deposition (CVD). Comparison of CNTs grown with the ultrasonication and exposure to water step, and CNTs grown in an identical manner but without the ultrasonication and exposure to water step, reveals a significant increase in the length of the CNTs when the ultrasonication and exposure to water step is included. The range of applications for CNTs with increased length covers gas diffusion layers for fuel cells to thin conductive film
FIG. 3B is an image of nanotubes grown in the conventional manner.
FIG. 4A is an image of nanotubes grown in accordance with Parsapour’s method.


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