Brewer Science, Inc. (Rolla, MO), a major innovator of high-technology solutions for the semiconductor and microelectronics markets, earned U.S. Patent 7,695,890 for its new photosensitive composition useful as a protective layer in the manufacture of microelectronic devices used in microelectromechanical systems (MEMS).
Brewer Science’s new invention provides a spin-applied, photosensitive coating system that replaces prior art masks or protective coatings, eliminating the need for additional photoresists. The new system protects device features from corrosion and other forms of attack during etching processes.
The invention will allow customers to save time and expense over previous technologies, which required additional protective layers and etching. This new technology will enhance throughput by reducing the number of process steps and simplify the process flow with minimal impact on overall performance.
The photosensitive etch protection coating can be used to create through-wafer pressure membranes and vias. The coating system also has applications in fabricating pressure sensors, silicon microphones, and RF MEMS devices.
The new photoresists for use during the production of semiconductor and MEMS devices are a primer layer preferably comprised of a silane dissolved or dispersed in a solvent system. The photoresist layer includes copolymers prepared from styrene, acrylonitrile, and epoxy-containing monomers. The photoresist layer comprises a photoacid generator, and is preferably negative-acting, say inventors Xing-Fu Zhong, Jyoti K Malhotra and Chenghong Li.
Providing new technologies is a part of Brewer Science’s commitment to its customers to help them achieve success with current and future technologies. Brewer Science enables advancements in future technology.