The National Institute of Standards & Technology (NIST) seeks information on commercial vendors capable of providing a doped polysilicon process upgrade in support of several on-going scientific and technical research projects in the Center for Nanoscale Science and Technology (CNST) NanoFab laboratory. The system will be sited and used in a multi-user facility.
After the results of this market research are obtained and analyzed and specifications are developed for a doped polysilicon process upgrade that can meet NIST's minimum requirements, NIST may conduct a competitive procurement. If at least two qualified small business manufacturers are identified during this market research stage, then any competitive procurement that resulted would be conducted as a small business set-aside.
The system would need to meet the following requirements:
1. SCOPE: Upgrade existing Tystar Mini-Tytan 4600 LPCVD Undoped Polysilicon Deposition Furnace to include P and N doped Polysilicon processes. The furnace is currently configured with a 200mm ID process tube and one SiH4 gas deposition channel.
2. SUBSTRATE SIZE: System must be capable of handling substrates from small irregular shaped pieces up to and including 150mm wafer rounds with minimal retooling necessary.
3. BASIC PROCESS SPECIFICATIONS
3.1 P and N doping concentrations from 1 x 1015 to 5 x 1020 at/cm3
3.2 Doping uniformity across 6” wafer and 50 wafer load <5% [(max-min)/2mean]
3.3 Thickness uniformity across 6” wafer and 50 wafer load <5% [(max-min)/2mean]
3.4 Final System Leak Rate < 5mT/min after 30 min pump down from atmosphere.
3.5 Base Pressure < 5mT after 10 min pump down from atmosphere.
4. HARDWARE SPECIFICATIONS
4.1 Modifications as necessary to existing furnace
4.2 Vacuum system upgrades including Dry Vacuum Pump, Particle Trap, etc.
4.3 Complete set of quartzware including wafer carriers for 4” and 6” processing.
4.4 Gas Panel with Corrosive/Toxic Gas MFCs for dopant source gases and SiH4 with MFC purge capability.
4.5 Dopant Source Gas Cabinet installed inside of existing furnace cabinet.
4.6 Must demonstrate solid prior experience in welding coaxial SS tubing for use with extremely toxic gases.
5. TECHNICAL SUPPORT is required including installation, as well as process development of P and N doped Polysilicon processes at various doping concentrations on 6” Si wafers.
6. OPERATING SOFTWARE: If the furnace control system is replaced as part of this upgrade, PC based software for recipe management and data logging is required.
NIST is seeking responses from all responsible sources, including large, foreign, and small businesses. Small businesses are defined under the associated NAICS code for this effort, 334516, as those domestic sources having 500 employees or less. Please include your company’s size classification in any response to this notice.
Companies that manufacture these types of systems are requested to email a detailed report describing their abilities to carol.wood@nist.gov no later than the response date for this sources sought notice.
The report should include achievable specifications, demonstrate dopant and deposition capability on Si samples, demonstrate prior systems that are currently installed and operating in multi-user type facilities, and any other information relevant to your product or capabilities. Also, the following information is requested to be provided as part of the response to this sources sought notice:
1. Name and business size of the company that manufactures the system for which specifications are provided;
2. Name of company(ies) that are authorized to sell the systems, their addresses, and a point of contact for the company (name, phone number, fax number and email address);
3. Indication of number of days, after receipt of order that is typical for delivery of such processes;
4. Indication of whether each system (including installation) for which specifications are sent to carol.wood@nist.gov are currently on one or more GSA Federal Supply Schedule contracts and, if so, the GSA FSS contract number(s);
5. Any other relevant information that is not listed above which the Government should consider in finalizing its market research.
All documentation must be sent to Carol A. Wood, Contract Specialist, at the National Institute of Standards and Technology, Acquisition Management Division, 100 Bureau Drive, Mail Stop 1640, Gaithersburg, MD 20899-1640. E-mail address: CAROL.WOOD@NIST.GOV.
After the results of this market research are obtained and analyzed and specifications are developed for a doped polysilicon process upgrade that can meet NIST's minimum requirements, NIST may conduct a competitive procurement. If at least two qualified small business manufacturers are identified during this market research stage, then any competitive procurement that resulted would be conducted as a small business set-aside.
The system would need to meet the following requirements:
1. SCOPE: Upgrade existing Tystar Mini-Tytan 4600 LPCVD Undoped Polysilicon Deposition Furnace to include P and N doped Polysilicon processes. The furnace is currently configured with a 200mm ID process tube and one SiH4 gas deposition channel.
2. SUBSTRATE SIZE: System must be capable of handling substrates from small irregular shaped pieces up to and including 150mm wafer rounds with minimal retooling necessary.
3. BASIC PROCESS SPECIFICATIONS
3.1 P and N doping concentrations from 1 x 1015 to 5 x 1020 at/cm3
3.2 Doping uniformity across 6” wafer and 50 wafer load <5% [(max-min)/2mean]
3.3 Thickness uniformity across 6” wafer and 50 wafer load <5% [(max-min)/2mean]
3.4 Final System Leak Rate < 5mT/min after 30 min pump down from atmosphere.
3.5 Base Pressure < 5mT after 10 min pump down from atmosphere.
4. HARDWARE SPECIFICATIONS
4.1 Modifications as necessary to existing furnace
4.2 Vacuum system upgrades including Dry Vacuum Pump, Particle Trap, etc.
4.3 Complete set of quartzware including wafer carriers for 4” and 6” processing.
4.4 Gas Panel with Corrosive/Toxic Gas MFCs for dopant source gases and SiH4 with MFC purge capability.
4.5 Dopant Source Gas Cabinet installed inside of existing furnace cabinet.
4.6 Must demonstrate solid prior experience in welding coaxial SS tubing for use with extremely toxic gases.
5. TECHNICAL SUPPORT is required including installation, as well as process development of P and N doped Polysilicon processes at various doping concentrations on 6” Si wafers.
6. OPERATING SOFTWARE: If the furnace control system is replaced as part of this upgrade, PC based software for recipe management and data logging is required.
NIST is seeking responses from all responsible sources, including large, foreign, and small businesses. Small businesses are defined under the associated NAICS code for this effort, 334516, as those domestic sources having 500 employees or less. Please include your company’s size classification in any response to this notice.
Companies that manufacture these types of systems are requested to email a detailed report describing their abilities to carol.wood@nist.gov no later than the response date for this sources sought notice.
The report should include achievable specifications, demonstrate dopant and deposition capability on Si samples, demonstrate prior systems that are currently installed and operating in multi-user type facilities, and any other information relevant to your product or capabilities. Also, the following information is requested to be provided as part of the response to this sources sought notice:
1. Name and business size of the company that manufactures the system for which specifications are provided;
2. Name of company(ies) that are authorized to sell the systems, their addresses, and a point of contact for the company (name, phone number, fax number and email address);
3. Indication of number of days, after receipt of order that is typical for delivery of such processes;
4. Indication of whether each system (including installation) for which specifications are sent to carol.wood@nist.gov are currently on one or more GSA Federal Supply Schedule contracts and, if so, the GSA FSS contract number(s);
5. Any other relevant information that is not listed above which the Government should consider in finalizing its market research.
All documentation must be sent to Carol A. Wood, Contract Specialist, at the National Institute of Standards and Technology, Acquisition Management Division, 100 Bureau Drive, Mail Stop 1640, Gaithersburg, MD 20899-1640. E-mail address: CAROL.WOOD@NIST.GOV.
https://www.fbo.gov/index?s=opportunity&mode=form&id=485a50a28c222bb17e9fc3a3c5de153d&tab=core&_cview=0
Submission must be received not later than 3:30 PM local time on March 15, 2010.
Submission must be received not later than 3:30 PM local time on March 15, 2010.
Contracting Office Address:
100 Bureau Drive, Building 301, Room B129, Mail Stop 1640
Gaithersburg, Maryland 20899-1640
Gaithersburg, Maryland 20899-1640
Place of Performance:
NIST
100 Bureau Drive
Gaithersburg, Maryland 20899
United States
100 Bureau Drive
Gaithersburg, Maryland 20899
United States
Primary Point of Contact.:
Carol A. Wood
Phone: 301-975-8172
Fax: 301-975-6273
Secondary Point of Contact:
Carol A. Wood
Phone: 301-975-8172
Fax: 301-975-6273
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