Brewer Science, the leading supplier of advanced lithography materials, has launched ARC®29L coating, a state-of-the-art ArF immersion bottom anti-reflective coating (BARC) that provides broad photoresist compatibility and tuned optical properties for use as a top layer in a dual layer BARC stack or as a single layer BARC on SiON.
The ARC®29L unique coating is designed with the widely recognized and proven platform of the Brewer Science® ARC®29SR coating. This advanced new material provides low reflectivities, of less than 0.1% for film thicknesses of less than 40nm. This product is ideal for extending leading-edge immersion processes in both single- and double-patterning lithography schemes.
"ARC®29L coating exceeds the demands for an immersion BARC" says Chris Cox, 193-nm Product Manager for Brewer Science. "As our customers push resolution limits with ArF immersion lithography, minimizing substrate reflectivity becomes more important than ever. The lower k value of ARC®29L coating delivers a novel option for improved reflectivity control on absorbing substrates such as SiON, TiN, SiN, or dual-layer BARCs. Being able to significantly enhance a tried and true BARC platform like the ARC®29SR coating is a tremendous benefit to our customers."
Brewer Science continuously improves leading-edge lithography products to reduce defectivity and outgassing and increase ease of line integration. For more information about the ARC®29L coatings please contact Chris Cox.
The ARC®29L unique coating is designed with the widely recognized and proven platform of the Brewer Science® ARC®29SR coating. This advanced new material provides low reflectivities, of less than 0.1% for film thicknesses of less than 40nm. This product is ideal for extending leading-edge immersion processes in both single- and double-patterning lithography schemes.
"ARC®29L coating exceeds the demands for an immersion BARC" says Chris Cox, 193-nm Product Manager for Brewer Science. "As our customers push resolution limits with ArF immersion lithography, minimizing substrate reflectivity becomes more important than ever. The lower k value of ARC®29L coating delivers a novel option for improved reflectivity control on absorbing substrates such as SiON, TiN, SiN, or dual-layer BARCs. Being able to significantly enhance a tried and true BARC platform like the ARC®29SR coating is a tremendous benefit to our customers."
Brewer Science continuously improves leading-edge lithography products to reduce defectivity and outgassing and increase ease of line integration. For more information about the ARC®29L coatings please contact Chris Cox.
Brewer Science, Inc has also released ARC® DS-K101P developer-soluble bottom anti-reflective coating (DBARC). This DBARC product has been formulated to meet the needs of the KrF photolithographer and augments processes where the resist budget is limited.
Building on a strong history of creating DBARCs, Brewer Science has developed a premium version of the successful Brewer Science® ARC® DS-K101 coating. ARC® DS-K101P KrF DBARC is designed to meet the tightening specifications of the 22-nm node and beyond. ARC® DS-K101P material has less than 1 ppb ions, while still maintaining the broad resist compatibly and tunability of the industry-proven ARC® DS-K101 coating. This new premium product will enable existing implant processes to transfer to future nodes.
“Brewer Science’s continuous improvement process supports customers with new leading-edge lithography products,” says Jim Lamb, Managing Director of Product Management at Brewer Science. “ARC® DS-K101P DBARC was created to give customers a valued solution for < 150-nm CD processes for implant, and a viable cost reduction for BEOL layers.”
The tight n and k optical constants of Brewer Science® ARC® DS-K101P coating provide consistent performance, while developer solubility can improve throughput by eliminating an etch step, which reduces the cost of ownership.
Brewer Science delivers innovative material, process, and equipment solutions for various applications including nanotechnology, lithography, advanced packaging, MEMS, optoelectronics, and compound semiconductors. As the inventor of ARC® anti-reflective coating products for the microlithography world, Brewer Science continues to expand its scope with CNTRENE® microelectronics-grade carbon nanotube solutions, ProTEK® temporary etch protective coatings, WaferBOND® temporary bonding materials, OptiNDEX(TM) high refractive index coatings, and Cee® processing equipment.
Contact information:
Chris Cox
Product Manager, Brewer Science, Inc.
Tel: +1 573-364-0300
Email: rcox@brewerscience.com.
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